Articles
Liqui-Cel® Membrane Contactors Easily Improve Megasonic Cleaning Performance By Controlling Total Dissolved Gases
March 12, 2009
•Technical Brief: Liqui-Cel® Membrane Contactors Easily Improve Megasonic Cleaning Performance By Controlling Total Dissolved Gases
By Membrana
The amount of dissolved gases present in water has a direct impact on cleaning efficiency in a megasoniccleaning bath.
UltraPure Water (UPW) from the polishing loop is commonly used in the megasonic cleaning process. Depending on the process design of the system, there are typically two scenarios in the system setup.
First, a system containing Liqui-Cel Contactors could be located in the polishing loop. Here the typical dissolved gas requirement is less than 1 ppb for O2 and around 3 ppm for N2.
Second, a Nitrogen blanketed tank could be located in the polishing loop. The typical dissolved gas requirements in this scenario are less than 1 ppb for O2.
Dissolved N2 would be saturated at ˜ 20 ppm because of the N2 pressure from the N2 blanket on top of the tank.
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