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RSSPrecise Control Of Dissolved O2 And N2 In Semiconductor Applications Using Liqui-Cel® Membrane Contactors
March 12, 2009
•Technical Brief: Precise Control Of Dissolved O2 And N2 In Semiconductor Applications Using Liqui-Cel® Membrane Contactors
By Membrana
There is a trend in the semiconductor industry for precise control of oxygen and nitrogen concentrations in ultrapure water. Specifically there is a goal in the polishing loop of a semiconductor plant to control dissolved oxygen to low levels of 1 ppb or 5 ppb. At the same time it is important to control the dissolved nitrogen between 8-12 ppm.
When it comes to total gas control, Liqui-Cel® Membrane Contactors offer the best solution; you can dial in your gas concentrations when using Membrane Contactors. Vacuum towers cannot be used to control multiple gasses to specific concentrations.
Membrane Contactors connected in two stages or two in series can achieve any combination of O2/N2 gas control. The primary advantage of using two contactors is that you can eliminate complicated process controls that would normally be required to handle the concentration swings of the incoming O2 and N2.
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