Download | September 14, 2007

Semiconductor Plant Improves Water Quality By Using Liqui-Cel® Membrane Contactors For Simultaneous Oxygen And Carbon Dioxide Removal From Water

Source: 3M Separation and Purification Sciences Division
A semiconductor plant in Taiwan is using Liqui-Cel® Membrane Contactors to remove dissolved gas from their ultra pure water (UPW) system. The UPW system is used to purify water used in the chemical mechanical polishing process (CMP) at the fab.